SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Thermomechanical behavior of EUV pellicle under dynamic exposure conditions
Panning, Eric M., Goldberg, Kenneth A., Goldfarb, Dario L., Bloomfield, Max O., Colburn, MatthewVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2218453
File:
PDF, 2.24 MB
english, 2016