In situ and ex situ NO oxidation assisted by...

In situ and ex situ NO oxidation assisted by sub-microsecond pulsed multi-pin-to-plane corona discharge: the effect of pin density

Sivachandiran, L., Khacef, A.
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Volume:
6
Year:
2016
Language:
english
Journal:
RSC Adv.
DOI:
10.1039/c6ra02972h
File:
PDF, 1.33 MB
english, 2016
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