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[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Local dielectric layers formation in Si and SiGe using focused ion beam implantation
Vyatkin, A.F., Gorbatov, Yu.B., Starkov, V.V., Konig, U., Hersener, Yu.Volume:
1
Year:
1998
Language:
english
DOI:
10.1109/iit.1999.812046
File:
PDF, 394 KB
english, 1998