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Study on organosilicon positive resist. II. Organosilicon positive photoresist (OSPR–1334) and its application to bilayer resist system
Hisashi Sugiyama, Akiko Mizushima, Takashi Inoue, Kazuo NateVolume:
44
Year:
1992
Language:
english
Pages:
8
DOI:
10.1002/app.1992.070440910
File:
PDF, 594 KB
english, 1992