[IEEE 2015 International Conference on IC Design & Technology (ICICDT) - Leuven, Belgium (2015.6.1-2015.6.3)] 2015 International Conference on IC Design & Technology (ICICDT) - I/O thick oxide device integration using Diffusion and Gate Replacement (D&GR) gate stack integration
Ritzenthaler, R., Schram, T., Cho, M. J., Mocuta, A., Horiguchi, N., Thean, A. V.-Y., Spessot, A., Caillat, C., Aoulaiche, M., Fazan, P., Noh, K. B., Son, Y.Year:
2015
Language:
english
DOI:
10.1109/icicdt.2015.7165908
File:
PDF, 696 KB
english, 2015