[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Diffusion and activation behaviors of boron by incorporated nitrogen ions in ammonia ambient
Jung-Ho Lee,, Kil-Ho Lee,, Sahng-Kyoo Lee,Volume:
2
Year:
1998
Language:
english
DOI:
10.1109/iit.1998.813834
File:
PDF, 385 KB
english, 1998