[IEEE 2014 20th International Conference on Ion Implantation Technology (IIT) - Portland, OR, USA (2014.6.26-2014.7.4)] 2014 20th International Conference on Ion Implantation Technology (IIT) - Out-diffusion of cesium and rubidium from amorphized silicon during solid-phase epitaxial regrowth
Maier, R., Haublein, V., Ryssel, H.Year:
2014
Language:
english
DOI:
10.1109/iit.2014.6939974
File:
PDF, 415 KB
english, 2014