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[IEEE 2014 Silicon Nanoelectronics Workshop (SNW) - Honolulu, HI, USA (2014.6.8-2014.6.9)] 2014 Silicon Nanoelectronics Workshop (SNW) - Impact of thermal treatments on the schottky barrier height reduction at the Ti-TiOx-Si interface for contact resistance reduction
Lee, Albert, Pethe, Abhijit, Joshi, Amol, Bouche, Guillaume, Koh, Shaoming, Nimii, Hiroaki, Mujumdar, Salil, Hong, Zhendong, Fuchigami, Nobi, Lim, Ira, Bodke, Ashish, Raymond, Mark, Besser, Paul, BarsYear:
2014
Language:
english
DOI:
10.1109/snw.2014.7348552
File:
PDF, 299 KB
english, 2014