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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - High chi polymer development for DSA applications using RAFT technology
Sheehan, Michael T., Farnham, William B., Tran, Hoang V., Londono, J. David, Brun, Yefim, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2018255
File:
PDF, 362 KB
english, 2013