Extreme ultraviolet proximity lithography for fast,...

Optics Express 2015 / 10 Vol. 23; Iss. 20

Extreme ultraviolet proximity lithography for fast, flexible and parallel fabrication of infrared antennas

Kunkemöller, Georg, Maß, Tobias W. W., Michel, Ann-Katrin U., Kim, Hyun-Su, Brose, Sascha, Danylyuk, Serhiy, Taubner, Thomas, Juschkin, Larissa
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Volume:
23
Language:
english
Journal:
Optics Express
DOI:
10.1364/OE.23.025487
Date:
October, 2015
File:
PDF, 3.16 MB
english, 2015
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