Patterning of nanodot-arrays using EUV achromatic Talbot...

Microelectronic Engineering 2016 / 04 Vol. 155

Patterning of nanodot-arrays using EUV achromatic Talbot lithography at the Swiss Light Source and Shanghai Synchrotron Radiation Facility

Fan, Daniel, Buitrago, Elizabeth, Yang, Shumin, Karim, Waiz, Wu, Yanqing, Tai, Renzhong, Ekinci, Yasin
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Volume:
155
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.02.026
Date:
April, 2016
File:
PDF, 1.74 MB
english, 2016
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