Towards a novel positive tone resist mr-PosEBR for high...

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Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography

Pfirrmann, Stefan, Voigt, Anja, Kolander, Anett, Grützner, Gabi, Lohse, Olga, Harder, Irina, Guzenko, Vitaliy A.
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Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.02.028
Date:
February, 2016
File:
PDF, 814 KB
english, 2016
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