Towards a novel positive tone resist mr-PosEBR for high resolution electron-beam lithography
Pfirrmann, Stefan, Voigt, Anja, Kolander, Anett, Grützner, Gabi, Lohse, Olga, Harder, Irina, Guzenko, Vitaliy A.Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2016.02.028
Date:
February, 2016
File:
PDF, 814 KB
english, 2016