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[IEEE 2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) - San Jose, CA, USA (2014.11.2-2014.11.6)] 2014 IEEE/ACM International Conference on Computer-Aided Design (ICCAD) - Fast lithographic mask optimization considering process variation
Su, Yu-Hsuan, Huang, Yu-Chen, Tsai, Liang-Chun, Chang, Yao-Wen, Banerjee, ShayakYear:
2014
Language:
english
DOI:
10.1109/iccad.2014.7001357
File:
PDF, 1.66 MB
english, 2014