[IEEE 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Washington DC, USA (2015.9.9-2015.9.11)] 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - ab-initio study on Schottky-Barrier modulation in NiSi2/Si interface
Jiseok Kim,, Byounghak Lee,, Yumi Park,, Murali, Kota V R M, Benistant, FrancisYear:
2015
Language:
english
DOI:
10.1109/sispad.2015.7292300
File:
PDF, 854 KB
english, 2015