[IEEE 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Washington DC, USA (2015.9.9-2015.9.11)] 2015 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD) - Specific contact resistivity of n-type Si and Ge M-S and M-I-S contacts
Jiseok Kim,, Oldiges, Phillip J., Hui-feng Li,, Niimi, Hiroaki, Raymond, Mark, Zeitzoff, Peter, Kamineni, Vimal, Adusumilli, Praneet, Chengyu Niu,, Chafik, FadouaYear:
2015
Language:
english
DOI:
10.1109/sispad.2015.7292302
File:
PDF, 471 KB
english, 2015