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[IEEE 2015 IEEE International Conference on Plasma Sciences (ICOPS) - Antalya, Turkey (2015.5.24-2015.5.28)] 2015 IEEE International Conference on Plasma Sciences (ICOPS) - Modeling of inductively coupled plasma source with argon/oxygen gas mixture for etching

Balouza, Samah M., Abou-Gabal, Hanaa H., Abdelrazek, Amr M.
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Year:
2015
Language:
english
DOI:
10.1109/plasma.2015.7179824
File:
PDF, 76 KB
english, 2015
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