[IEEE 2015 IEEE International Conference on Plasma Sciences (ICOPS) - Antalya, Turkey (2015.5.24-2015.5.28)] 2015 IEEE International Conference on Plasma Sciences (ICOPS) - Modeling of inductively coupled plasma source with argon/oxygen gas mixture for etching
Balouza, Samah M., Abou-Gabal, Hanaa H., Abdelrazek, Amr M.Year:
2015
Language:
english
DOI:
10.1109/plasma.2015.7179824
File:
PDF, 76 KB
english, 2015