An aqueous-base developable photoresist based on...

An aqueous-base developable photoresist based on light-induced cationic polymerization: Resist performance of poly(glycidyl methacrylate-co-methacrylic acid)

Kazuhiko Naitoh, Ken'ichi Koseki, Tsuguo Yamaoka
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Volume:
50
Year:
1993
Language:
english
Pages:
8
DOI:
10.1002/app.1993.070500205
File:
PDF, 724 KB
english, 1993
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