![](/img/cover-not-exists.png)
An aqueous-base developable photoresist based on light-induced cationic polymerization: Resist performance of poly(glycidyl methacrylate-co-methacrylic acid)
Kazuhiko Naitoh, Ken'ichi Koseki, Tsuguo YamaokaVolume:
50
Year:
1993
Language:
english
Pages:
8
DOI:
10.1002/app.1993.070500205
File:
PDF, 724 KB
english, 1993