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Threshold voltage variation-immune FinFET design with metal-interlayer-semiconductor source/drain structure
Shin, Changho, Kim, Jeong-Kyu, Shin, Changhwan, Kim, Jong-Kook, Yu, Hyun-YongVolume:
16
Language:
english
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2016.03.006
Date:
June, 2016
File:
PDF, 1.72 MB
english, 2016