Changes in the structure properties and CMP...

Changes in the structure properties and CMP manufacturability of a poly-Si film induced by deposition and annealing processes

Park, Sungmin, Jeong, Haedo, Yoon, Sang-Hee
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Volume:
234
Language:
english
Journal:
Journal of Materials Processing Technology
DOI:
10.1016/j.jmatprotec.2016.03.015
Date:
August, 2016
File:
PDF, 1.76 MB
english, 2016
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