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[IEEE 2015 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2015.3.15-2015.3.16)] 2015 China Semiconductor Technology International Conference - Sub resolution assist feature study in 28nm node poly lithographic process
Xiaoming Mao,, Zhengkai Yang,, Xiaobo Guo,, Zhifeng Gan,, Biqiu Liu,, Zhibiao Mao,Year:
2015
Language:
english
DOI:
10.1109/cstic.2015.7153347
File:
PDF, 1.12 MB
english, 2015