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Poly(n-butyl α-cyanoacrylate): A highly sensitive and high contrast resist for electron-beam and X-ray lithography
Eranian, Armand, Datamanti, Evelyne, Dubois, Jean-Claude, Serre, Brigitte, Schué, Francois, Montginoul, Claude, Giral, LouisVolume:
19
Language:
english
Journal:
British Polymer Journal
DOI:
10.1002/pi.4980190319
Date:
May, 1987
File:
PDF, 992 KB
english, 1987