![](/img/cover-not-exists.png)
Evaluation of Si etching yields by Cl + Br + and HBr + ion irradiation
Ito, Tomoko, Karahashi, Kazuhiro, Kang, Song-Yun, Hamaguchi, SatoshiVolume:
232
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/232/1/012021
Date:
June, 2010
File:
PDF, 551 KB
english, 2010