Evaluation of Si etching yields by Cl +...

Evaluation of Si etching yields by Cl + Br + and HBr + ion irradiation

Ito, Tomoko, Karahashi, Kazuhiro, Kang, Song-Yun, Hamaguchi, Satoshi
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Volume:
232
Language:
english
Journal:
Journal of Physics: Conference Series
DOI:
10.1088/1742-6596/232/1/012021
Date:
June, 2010
File:
PDF, 551 KB
english, 2010
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