Band Offset Characterization of the Atomic Layer Deposited...

Band Offset Characterization of the Atomic Layer Deposited Aluminum Oxide on m-Plane Indium Nitride

Jia, Ye, Wallace, Joshua S., Qin, Yueling, Gardella, Joseph A., Dabiran, Amir M., Singisetti, Uttam
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Volume:
45
Language:
english
Journal:
Journal of Electronic Materials
DOI:
10.1007/s11664-015-4175-9
Date:
April, 2016
File:
PDF, 1.31 MB
english, 2016
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