Poly-Si Thin Film by ICP-CVD and ELA at 150°C For Flexible...

Physica Scripta 2004 / 01 Vol. T114

Poly-Si Thin Film by ICP-CVD and ELA at 150°C For Flexible Substrates

Han, Sang-Myeon, Lee, Min-Cheol, Kang, Su-Hyuk, You, Bong-Hyun, Han, Min-Koo
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Volume:
T114
Language:
english
Journal:
Physica Scripta
DOI:
10.1088/0031-8949/2004/t114/033
Date:
January, 2004
File:
PDF, 508 KB
english, 2004
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