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[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Electrical activation of B implanted in silicon at energies below 1 keV
Privitera, V., Napolitani, E., Priolo, F., Mannino, G., Settanni, C., Camalleri, M., Rimini, E.Year:
2000
Language:
english
DOI:
10.1109/iit.2000.924089
File:
PDF, 382 KB
english, 2000