SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - A route for industry compatible directed self-assembly of high-chi PS-PDMS block copolymers
Bencher, Christopher, Cheng, Joy Y., Böhme, S., Girardot, C., Garnier, J., Arias-Zapata, J., Arnaud, S., Tiron, R., Marconot, O., Buttard, D., Zelsmann, M.Volume:
9777
Year:
2016
Language:
english
DOI:
10.1117/12.2219312
File:
PDF, 935 KB
english, 2016