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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Feasibility of a new absorber material for high NA extreme ultraviolet lithography
Panning, Eric M., Goldberg, Kenneth A., Ko, Ki-Ho, Oh, Hye-KeunVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2219576
File:
PDF, 790 KB
english, 2016