A controlled growth of WNx and WCx thin films prepared by...

Materials Letters 2016 / 04 Vol. 168

A controlled growth of WNx and WCx thin films prepared by atomic layer deposition

Kim, Jun Beom, Jang, Byeonghyeon, Lee, Hyun-Jung, Han, Won Seok, Lee, Do-Joong, Lee, Han-Bo-Ram, Hong, Tae Eun, Kim, Soo-Hyun
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Volume:
168
Language:
english
Journal:
Materials Letters
DOI:
10.1016/j.matlet.2016.01.071
Date:
April, 2016
File:
PDF, 1.45 MB
english, 2016
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