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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Metrology, Inspection, and Process Control for Microlithography XXVII - Three-dimensional profile extraction from CD-SEM image and top/bottom CD measurement by line-edge roughness analysis
Yamaguchi, Atsuko, Ohashi, Takeyoshi, Kawasaki, Takahiro, Inoue, Osamu, Kawada, Hiroki, Starikov, Alexander, Cain, Jason P.Volume:
8681
Year:
2013
Language:
english
DOI:
10.1117/12.2013422
File:
PDF, 927 KB
english, 2013