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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Design-Process-Technology Co-optimization for Manufacturability VIII - Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes
Sturtevant, John L., Capodieci, Luigi, Torres, J. Andres, Sakajiri, Kyohei, Fryer, David, Granik, Yuri, Ma, Yuansheng, Krasnova, Polina, Fenger, Germain, Nagahara, Seiji, Kawakami, Shinichiro, RathsacVolume:
9053
Year:
2014
Language:
english
DOI:
10.1117/12.2045328
File:
PDF, 4.47 MB
english, 2014