SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Determination of line edge roughness in low dose top-down scanning electron microscopy images
Cain, Jason P., Sanchez, Martha I., Verduin, T., Kruit, P., Hagen, C. W.Volume:
9050
Year:
2014
Language:
english
DOI:
10.1117/12.2046493
File:
PDF, 1.41 MB
english, 2014