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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Metrology, Inspection, and Process Control for Microlithography XXVIII - Metrology for directed self-assembly block lithography using optical scatterometry
Cain, Jason P., Sanchez, Martha I., Dixit, Dhairya, Kamineni, Vimal, Farrell, Richard, Hosler, Erik, Preil, Moshe, Race, Joseph, Peterson, Brennan, Diebold, Alain C.Volume:
9050
Year:
2014
Language:
english
DOI:
10.1117/12.2047111
File:
PDF, 2.48 MB
english, 2014