SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advanced Etch Technology for Nanopatterning III - Line width roughness reduction strategies for patterns exposed via electron beam lithography
Oehrlein, Gottlieb S., Lin, Qinghuang, Zhang, Ying, Jussot, J., Pargon, E., Icard, B., Bustos, J., Pain, L.Volume:
9054
Year:
2014
Language:
english
DOI:
10.1117/12.2047972
File:
PDF, 888 KB
english, 2014