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Area-selective chemical vapor deposition of Co for Cu capping layer
Ryu, Seung Wook, Kim, Soohyeon, Yoon, Jaehong, Tanskanen, Jukka T., Kim, Hyungjun, Lee, Han-Bo-RamVolume:
16
Language:
english
Journal:
Current Applied Physics
DOI:
10.1016/j.cap.2015.10.013
Date:
January, 2016
File:
PDF, 920 KB
english, 2016