Deposition Mechanism of Aluminum Oxide on Quantum Dot Films at Atmospheric Pressure and Room Temperature
Valdesueiro, David, Prabhu, Mahesh Krishna, Guerra-Nunez, Carlos, Sandeep, C. S. Suchand, Kinge, Sachin, Siebbeles, Laurens D. A., de Smet, Louis C. P. M., Meesters, Gabrie M. H., Kreutzer, Michiel T.Volume:
120
Language:
english
Journal:
The Journal of Physical Chemistry C
DOI:
10.1021/acs.jpcc.5b11653
Date:
March, 2016
File:
PDF, 2.92 MB
english, 2016
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