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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Advances in Resist Technology and Processing XI - Characterization of the development of DNQ/novolac resists by surface energy measurements
Fadda, Emilienne, Amblard, Gilles R., Weill, Andre P., Prola, Alain, Nalamasu, OmkaramVolume:
2195
Year:
1994
Language:
english
DOI:
10.1117/12.175371
File:
PDF, 336 KB
english, 1994