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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Advances in Resist Technology and Processing XII - Unique spin coat process for positive photoresists
Lyons, Dan, Beauchemin, Jr., Bernard T., Garrard, Susan, Allen, Robert D.Volume:
2438
Year:
1995
Language:
english
DOI:
10.1117/12.210409
File:
PDF, 290 KB
english, 1995