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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Modeling of postexposure bake and surface inhibition effects in positive photoresist using absolute thickness data
Robertson, Stewart A., Stevenson, J. Tom M., Holwill, Robert J., Hansen, Steven G., Ebersole, Charles E., Thirsk, Mark, Daraktchiev, Ivan S., Novembre, Anthony E.Volume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59747
File:
PDF, 879 KB
english, 1992