![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Rigorous simulation and optimization of the lithography/directed self-assembly co-process
Lai, Kafai, Erdmann, Andreas, Fühner, Tim, Welling, Ulrich, Müller, Marcus, Erdmann, AndreasVolume:
9052
Year:
2014
Language:
english
DOI:
10.1117/12.2047381
File:
PDF, 1.65 MB
english, 2014