SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Advances in Patterning Materials and Processes XXXI - Investigation of interactions between metrology and lithography with a CD SEM simulator
Wallow, Thomas I., Hohle, Christoph K., Smith, Mark D., Fang, Chao, Biafore, John J., Vaglio Pret, Alessandro, Robertson, Stewart A.Volume:
9051
Year:
2014
Language:
english
DOI:
10.1117/12.2048247
File:
PDF, 1.61 MB
english, 2014