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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Improvement of sub-20nm pattern quality with dose modulation technique for NIL template production
Bencher, Christopher, Cheng, Joy Y., Yagawa, Keisuke, Ugajin, Kunihiro, Suenaga, Machiko, Kanamitsu, Shingo, Motokawa, Takeharu, Hagihara, Kazuki, Arisawa, Yukiyasu, Kobayashi, Sachiko, Saito, Masato,Volume:
9777
Year:
2016
Language:
english
DOI:
10.1117/12.2218809
File:
PDF, 1.06 MB
english, 2016