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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - A paradigm shift in patterning foundation from frequency multiplication to edge-placement accuracy: a novel processing solution by selective etching and alternating-material self-aligned multiple patterning
Bencher, Christopher, Cheng, Joy Y., Han, Ting, Liu, Hongyi, Chen, YijianVolume:
9777
Year:
2016
Language:
english
DOI:
10.1117/12.2218874
File:
PDF, 1.48 MB
english, 2016