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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV process establishment through litho and etch for N7 node
Panning, Eric M., Goldberg, Kenneth A., Kuwahara, Yuhei, Kawakami, Shinichiro, Kubota, Minoru, Matsunaga, Koichi, Nafus, Kathleen, Foubert, Philippe, Mao, MingVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2218885
File:
PDF, 442 KB
english, 2016