SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Fundamental study on dissolution behavior of poly(methyl methacrylate) by quartz crystal microbalance
Panning, Eric M., Goldberg, Kenneth A., Konda, Akihiro, Yamamoto, Hiroki, Yoshitake, Shusuke, Kozawa, TakahiroVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2218965
File:
PDF, 327 KB
english, 2016