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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Sub-15nm patterning technology using directed self-assembly on nano-imprinting guide
Bencher, Christopher, Cheng, Joy Y., Morita, Seiji, Kanno, Masahiro, Yamamoto, Ryousuke, Sasao, Norikatsu, Sugimura, ShinobuVolume:
9777
Year:
2016
Language:
english
DOI:
10.1117/12.2219141
File:
PDF, 1.10 MB
english, 2016