SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Alternative Lithographic Technologies VIII - Process highlights to enhance DSA contact patterning performances

Bencher, Christopher, Cheng, Joy Y., Gharbi, A., Tiron, R., Argoud, M., Chamiot-Maitral, G., Fouquet, A., Lapeyre, C., Pimenta Barros, P., Sarrazin, A., Servin, I., Delachat, F., Bos, S., Bérard-Berge
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Volume:
9777
Year:
2016
Language:
english
DOI:
10.1117/12.2219210
File:
PDF, 2.72 MB
english, 2016
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