![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - EUV patterned templates with grapho-epitaxy DSA at the N5/N7 logic nodes
Panning, Eric M., Goldberg, Kenneth A., Gronheid, Roel, Boeckx, Carolien, Doise, Jan, Bekaert, Joost, Karageorgos, Ioannis, Ruckaert, Julien, Chan, Boon Teik, Lin, Chenxi, Zou, YiVolume:
9776
Year:
2016
Language:
english
DOI:
10.1117/12.2219876
File:
PDF, 1.05 MB
english, 2016