SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Design-Process-Technology Co-optimization for Manufacturability X - Triple/quadruple patterning layout decomposition via novel linear programming and iterative rounding
Capodieci, Luigi, Cain, Jason P., Lin, Yibo, Xu, Xiaoqing, Yu, Bei, Baldick, Ross, Pan, David Z.Volume:
9781
Year:
2016
Language:
english
DOI:
10.1117/12.2218628
File:
PDF, 665 KB
english, 2016