SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Directed self-assembly of diblock copolymers in multi-VIA configurations: effect of chemopatterned substrates on defectivity
Hohle, Christoph K., Younkin, Todd R., Carpenter, Corinne L., Delaney, Kris T., Fredrickson, Glenn H.Volume:
9779
Year:
2016
Language:
english
DOI:
10.1117/12.2218644
File:
PDF, 2.05 MB
english, 2016