SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Metal containing material processing on coater/developer system
Hohle, Christoph K., Younkin, Todd R., Kawakami, Shinichiro, Mizunoura, Hiroshi, Matsunaga, Koichi, Hontake, Koichi, Nakamura, Hiroshi, Shimura, Satoru, Enomoto, MasashiVolume:
9779
Year:
2016
Language:
english
DOI:
10.1117/12.2219106
File:
PDF, 2.76 MB
english, 2016